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A. Panou
Plasma Technology Lab, Dept.Chem. Engineering, University of Pates, P.O.Box 1407,26500 Patra, Greece
Articles:
TEOS/O
2
GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO
2
THIN FILMS
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Vol. 9 '2005
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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
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