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传热学
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传热学

DOI: 10.1615/HeatTransRes.2017015899
pages 145-156

CHARACTERISTICS OF WATER EVAPORATION ON A NANOPATTERNED SURFACE FABRICATED BY UV NANOIMPRINT LITHOGRAPHY

Noriyuki Unno
Department of Mechanical Engineering, Tokyo University of Science, Yamaguchi, 1-1-1 Digakudo-ri, Sanyo-onoda, Yamaguchi, 756-0884 Japan
Motoharu Asano
Department of Applied Electronics, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo, Japan
Yuki Matsuda
Department of Applied Electronics, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo, Japan
Shin-ichi Satake
Department of Applied Electronics, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo 125-8585 Japan
Jun Taniguchi
Department of Applied Electronics, Tokyo University of Science, 6-3-1 Niijuku, Katsushika-ku, Tokyo 125-8585, Japan

ABSTRACT

We investigated the behavior of water droplet evaporation on a nanopatterned surface. The nanopattern was fabricated by ultraviolet nanoimprint lithography (UV-NIL) on a transparent film using an UV curable resin. In this study, a moth-eye structure, which is used for anti-reflection, on a glassy carbon substrate was used as a master mold. Furthermore, a nanopattern made of the UV curable resin via UV-NIL was also used as a replica mold, and we succeeded in fabrication of a second generation nanopatterned film. Using both obtained transparent films with nanopattern, the evaporation characteristics of a water droplet were investigated. As a result, it became clear that the speed of evaporation on the first and second generation films was improved, compared to the substrate without the nanopattern. Moreover, the nanopatterned surface has a lower reflectance ratio than the planar surface. Consequently, the obtained film can be a multifunctional transparent film to prevent the light reflection and improve the evaporation rate of water droplet.


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