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国际流体力学研究期刊
ESCI SJR: 0.206 SNIP: 0.446 CiteScore™: 0.5

ISSN 打印: 2152-5102
ISSN 在线: 2152-5110

国际流体力学研究期刊

DOI: 10.1615/InterJFluidMechRes.2018025940
pages 407-425

MHD FLOW OF CHEMICALLY REACTING WILLIAMSON FLUID OVER A CURVED/FLAT SURFACE WITH VARIABLE HEAT SOURCE/SINK

Kempannagari Anantha Kumar
Department of Mathematics, Sri Venkateswara University, Tirupati-517 502, India
J. V. Ramana Reddy
Department of Mathematics, Sri Venkateswara University, Tirupati-517502, India; Department of Science and Humanities, Krishna Chaitanya Institute of Technology and Sciences, Markapur, India
Vangala Sugunamma
Department of Mathematics, Sri Venkateswara University, Tirupati-517502, India
N. Sandeep
Department of Mathematics, Central University of Karnataka, Kalaburagi-585 367, India

ABSTRACT

In the current scrutiny, we bestowed dual solutions of MHD flow of Williamson fluid over a curved sheet. We imagine that the fluid motion is laminar and time dependent. This analysis is carried out subject to variable heat generation/absorption, radiation, and chemical reaction. The modeled equations are transformed as dimensionless and solved using the fourth-order Runge-Kutta-based shooting technique. Various flow fields are analyzed through graphs. Furthermore, numerical values are presented for the skin friction coefficient and local Nusselt and Sherwood numbers. The outcomes indicate that the temperature and concentration distributions are increasing functions of curvature parameter. Also, the velocity field is declared as a reducing function of both unsteadiness and Williamson fluid parameters.

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