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国际藻类期刊
SJR: 0.229 SNIP: 0.261 CiteScore™: 0.24

ISSN 打印: 1521-9429
ISSN 在线: 1940-4328

国际藻类期刊

DOI: 10.1615/InterJAlgae.v20.i4.20
pages 339-358

On the Inheritance of Induced Resistance to Toxic Concentrations of Sulfur Acid of Copper by Subsequent Cell Generations of Dunaliella viridis Teodoresco

A. I. Bozhkov
Research Institute of Biology, V.N. Karazin Kharkov National University, 4 Svobody Sq., Kharkov 61022, Ukraine
A. V. Goltvyanskiy
Research Institute of Biology, V.N. Karazin Kharkov National University, 4 Svobody Sq., Kharkov 61022, Ukraine
M. K. Kovaleva
Research Institute of Biology, V.N. Karazin Kharkov National University, 4 Svobody Sq., Kharkov 61022, Ukraine
N. G. Menzyanova
Research Institute of Biology, V.N. Karazin Kharkov National University, 4 Svobody Sq., Kharkov 61022, Ukraine

ABSTRACT

The ability of the Dunaliella viridis culture to adapt to toxic concentrations of copper sulphate and the possibility of inheriting such resistance in a number of cell generations was investigated. First, the primary (natural) resistance of D. viridis to the effects of copper sulfate concentrations from 0.0001 to 100 mg/L was checked, as well as the ability of the culture to adapt to repeated consecutive additions of this toxicant to the medium. A U-shaped dependence of both motility and the formation of cell aggregates on the dose and time of incubation was revealed. Multiple successive additions of copper sulfate (110 passages) resulted in the formation of the culture's resistance even to lethal concentrations. It was shown that in the process of adaptation to copper ions, a specific metabolic pattern (epigenotype) is formed in D. viridis cells. It differs from the epigenotypes of the control culture and ensures the preservation of cell viability after their accumulation of large amounts (the rise makes 130-240 times) of copper ions. Such induced resistance to copper ions can be inherited in a number of cell generations due to the high structural and functional heterogeneity of the cell populations and hormesis effect.


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