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ICHMT主页 当年 旧刊 执委 International Centre for Heat and Mass Transfer

MODELING THE RADIATIVE PROPERTIES OF SEMITRANSPARENT WAFERS WITH ROUGH SURFACES AND THIN-FILM COATINGS

DOI: 10.1615/ICHMT.2004.RAD-4.220
10 pages

H. J. Lee
George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0405, USA

B. J. Lee
George W. Woodruff School of Mechanical Engineering, Georgia Institute of Technology, Atlanta, GA 30332-0405, USA

Abstract

Semitransparent materials with rough surfaces and coatings have a wide range of applications. This work incorporates the thin-film optics formulation into the Monte Carlo ray-tracing method to predict the radiative properties of semitransparent wafers, considering surface roughness and coating effects. Multiple reflections and interference inside the coating are included by assuming that the coating thickness does not change along the rough surface. However, geometric optics is applied to trace the rays between the surfaces of the wafer. Instead of generating a random rough surface a priori, a weighted probability density function, based on the surface slope distribution and the projected area, is used to determine the microfacet orientation each time a ray hits the interface. The computational code has been validated against the conservation of energy and the reciprocity principle. The studied examples, with Si wafers and either SiO2 or Au coatings, demonstrate the strong influence of roughness and coating on the bidirectional and directional-hemispherical radiative properties. This study helps the further understanding of the radiative properties of semitransparent wafers with rough surfaces and will have an impact on semiconductor processing.

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