Abo Bibliothek: Guest
Digitales Portal Digitale Bibliothek eBooks Zeitschriften Referenzen und Berichte Forschungssammlungen
Heat Transfer Research
Impact-faktor: 0.404 5-jähriger Impact-Faktor: 0.8 SJR: 0.264 SNIP: 0.504 CiteScore™: 0.88

ISSN Druckformat: 1064-2285
ISSN Online: 2162-6561

Volumes:
Volumen 50, 2019 Volumen 49, 2018 Volumen 48, 2017 Volumen 47, 2016 Volumen 46, 2015 Volumen 45, 2014 Volumen 44, 2013 Volumen 43, 2012 Volumen 42, 2011 Volumen 41, 2010 Volumen 40, 2009 Volumen 39, 2008 Volumen 38, 2007 Volumen 37, 2006 Volumen 36, 2005 Volumen 35, 2004 Volumen 34, 2003 Volumen 33, 2002 Volumen 32, 2001 Volumen 31, 2000 Volumen 30, 1999 Volumen 29, 1998 Volumen 28, 1997

Heat Transfer Research

DOI: 10.1615/HeatTransRes.v38.i1.70
pages 71-84

Numerical Modeling of Heat and Mass Transfer Processes in PECVD Reactors for Growing Silicon Films under the Conditions of Intense Formation of Higher Silanes in the Gas Phase

Yuriy E. Gorbachev
Institute of High-Performance Computations and Databases of the St. Petersburg State Polytechnic University, Russian Federation
M. A. Zatevakhin
Institute of High-Performance Computations and Databases of the St. Petersburg State Polytechnic University, Russian Federation
A. A. Ignatiev
Institute of High-Performance Computations and Databases of the St. Petersburg State Polytechnic University, Russian Federation
Valeria Krzhizhanovskaya
University of Amsterdam, The Netherlands

ABSTRAKT

A model of the process of growth of an amorphous silicon film from HF discharge silane plasma in plasma-chemical reactors has been developed. The model takes into account homogeneous chemical reactions, deposition of radicals on the walls, diffusion, convection, and formation of higher silanes. A parallel algorithm for computations on multi-processor systems has been built. A software complex has been created for 3Dcomputations. Processes affecting the film growth have been investigated.


Articles with similar content:

SIMULATION AND OPTIMIZATION OF LOW PRESSURE CHEMICAL VAPOR DEPOSITION BATCH FURNACES FOR MICROELECTRONICS MANUFACTURING
International Heat Transfer Conference 11, Vol.12, 1998, issue
William G. Houf
Chemical Vapor Deposition in Low Pressure Batch Furnaces
International Heat Transfer Conference 10, Vol.19, 1994, issue
William G. Houf, J. F. Grcar
HIGH-RATE SILICON NITRIDE DEPOSITION FOR PHOTOVOLTAICS: FROM FUNDAMENTALS TO INDUSTRIAL APPLICATION
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.9, 2005, issue 1
M.D. Bijker, P. J. van den Oever, W.M.M. Kessels, D. C. Schram, R.C.M. Bosch, M. Evers, M.C.M. van de Sanden
HEAT TRANSFER IN SHEAR-DRIVEN THIN LIQUID FILM FLOWS
Computational Thermal Sciences: An International Journal, Vol.5, 2013, issue 4
Tatiana Gambaryan-Roisman, Peter Stephan, M. Budakli, Jagannath Rao Marati
CFD SIMULATION OF TRANSPORT PHENOMENA IN WASTEWATER TREATMENT VIA VACUUM MEMBRANE DISTILLATION
Journal of Porous Media, Vol.19, 2016, issue 6
Mehdi Ghadiri, Rasool Pelalak, Hadi Soltani, Zahra Heidari, Saeed Shirazian