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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Erscheint 4 Ausgaben pro Jahr

ISSN Druckformat: 1093-3611

ISSN Online: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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Numerical modeling for a better understanding of gas discharge plasmas

Volumen 9, Ausgabe 3, 2005, pp. 321-344
DOI: 10.1615/HighTempMatProc.v9.i3.10
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ABSTRAKT

We present here some of our modeling efforts for gas discharge plasmas, used in a number of applications in materials science. Different kinds of modeling approaches are applied, including fluid models, particle-in-cell — Monte Carlo (PIC-MC) models and hybrid Monte Carlo — fluid models, for the plasma behavior, as well as molecular dynamics simulations for thin film growth. The application fields include the deposition of amorphous hydrogenated carbon layers (diamond-like carbon) from hydrocarbon plasmas, the dust formation in silane discharges, the surface treatment with dielectric-barrier discharges, magnetron discharges used for sputter-deposition, dual-frequency capacitively coupled radio-frequency (cc-rf) discharges in CF4/Ar/N2, for etching applications, and glow discharges for spectrochemical analysis of materials.

REFERENZIERT VON
  1. Jin Xing, Cheng Xianghui, Duan Faxin, Zhang Jingjing, Study on the Influence of RF Power on Inductively Coupled Plasma Ion Source Injector Gas, 2018 37th Chinese Control Conference (CCC), 2018. Crossref

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