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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Druckformat: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v11.i3.100
pages 431-441

SHEATH CHARACTERISTICS OF AN EXCIPLEX XE-NE-HCL LAMP PUMPED BY PHOTO TRIGGERED DISCHARGE

S. Bendella
Laboratory of Plasma physics, Materials conducting and their Applications Faculty of science. Department of Physics U.S.T.O.MB El M'NAOUERB.P 1505, Oran, ALGERIA
Ahmed Belasri
Laboratoire de Physique des Plasmas, Matériaux Conducteurs et leurs Applications, Université d'Oran des Sciences et de la Technologie USTO-MB, Faculté de Physique, Oran 31000, Algeria

ABSTRAKT

The role of the cathode layer in Xenon- Neon- HCl photo triggered discharge for exciplex lamps is studied in this work. We developed a one-dimensional model of the cathode sheath coupled to a kinetics model of plasma and with the external circuit. The one-dimensional model is based on the resolution of the equations of continuity with the Poisson's equation. In the kinetics model, the plasma is represented by a variable value of resistance in time. The electric and kinetic parameters of the discharge are discussed and analysed.


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