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ISSN Druckformat: 1093-3611
ISSN Online: 1940-4360
Indexed in
MECHANICAL AND ELECTROCHEMICAL PROPERTIES OF TANTALUM IMPLANTED BY NITROGEN IONS
ABSTRAKT
In this paper, the effect of ion beam irradiation on the formation of tantalum nitride has been studied. A bulk Ta surface was implanted with 30 keV nitrogen ions at a temperature of 100°C, with doses between 1 × 1017 and 1 × 1018 ions/cm2. The implanted samples were characterized by atomic force microscopy, X-ray diffraction analysis (XRD), and corrosion tests to identify structural, compositional, and electrochemical changes at various doses. The experimental results indicate the formation of hexagonal tantalum nitride (TaN0.43), in addition to the fact that by increasing the ion dose, the nitrogen atoms occupy more interstitial spaces in the target crystal, a case which can significantly improve the corrosion resistance. The maximum extent in the improvement of the microhardess was 80% and the reduction in the corrosion current was 83%.
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Boiko Oleksandr, Koltunowicz Tomasz N., Zukowski Pawel, Fedotov Alexander K., Larkin Andrey V., The effect of sputtering atmosphere parameters on dielectric properties of the ferromagnetic alloy – ferroelectric ceramics nanocomposite (FeCoZr)x(PbZrTiO3)(100−x), Ceramics International, 43, 2, 2017. Crossref