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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Druckformat: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v6.i1.30
12 pages

X-RAY AND CORPUSCULAR EMISSION FROM DIFFERENT PLASMA DISCHARGES OF AXIAL SYMMETRY

Elzbieta Skladnik-Sadowska
The Andrzej Soltan Institute for Nuclear Studies (IPJ) 05-400 Otwock-Swierk by Warsaw, Poland
Jaroslaw Baranowski
The Andrzej Soltan Institute for Nuclear Studies (IPJ) 05-400 Otwock-Swierk by Warsaw, Poland
Marek Sadowski
Department of Plasma Physics and Technology (P-V) The Andrzej Soltan Institute for Nuclear Studies (IPJ) 05-400 Otwock-Swierk by Warsaw, Poland
Jaroslaw Zebrowski
Department of Plasma Physics and Technology (P-V) The Andrzej Soltan Institute for Nuclear Studies (IPJ) 05-400 Otwock-Swierk by Warsaw, Poland

ABSTRAKT

This paper reports on measurements of X-rays, ion- and electron-beams, as well as neutrons, which are emitted from plasmas generated within various coaxial injectors. Particular attention is paid to studies of so-called Multi-Rod Plasma Injectors (RPI devices) equipped with the coaxial electrodes consisting of many thin metal rods. Different techniques for time-integrated and time-resolved measurements of X-rays as well as pulsed ion- and electron-streams are presented. Three different modes of the operation of the RPI devices are described and compared. These modes depend on a time delay t between the activation of a pulsed gas-valve and the triggering of a high-voltage generator (supplying the electrodes). It is shown that for long time delays in the RPI-devices there appears a considerable decrease in the average value of ion kinetic energy. For a comparison the paper presents also some characteristics of X-rays and charged particles emitted from Plasma-Focus (PF) devices equipped with tubular metal electrodes. These emission characteristics are of primary importance for research and for technological applications of the described plasma facilities.


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