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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Erscheint 4 Ausgaben pro Jahr

ISSN Druckformat: 1093-3611

ISSN Online: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

Indexed in

Volumen 6, 2002 Ausgabe 1

DOI: 10.1615/HighTempMatProc.v6.i1

Studies of pulsed ion- and electron-beams emitted from plasma discharges Marek Sadowski, Jaroslaw Zebrowski
14 pages
DOI: 10.1615/HighTempMatProc.v6.i1.10
ELECTRON ENERGY DISTRIBUTION FUNCTION IN PLASMA ARC JETS V. Lago, A. Lebehot, Michel A. Dudeck, Z. Szymanski
8 pages
DOI: 10.1615/HighTempMatProc.v6.i1.20
X-RAY AND CORPUSCULAR EMISSION FROM DIFFERENT PLASMA DISCHARGES OF AXIAL SYMMETRY Elzbieta Skladnik-Sadowska, Jaroslaw Baranowski, Marek Sadowski, Jaroslaw Zebrowski
12 pages
DOI: 10.1615/HighTempMatProc.v6.i1.30
STRUCTURAL STUDIES ON SEMICONDUCTING HYDROGENATED AMORPHOUS SILICON OXIDE FILMS S. M. Iftiquar
19 pages
DOI: 10.1615/HighTempMatProc.v6.i1.40
Modelling of plasma dynamics in coaxial IPD accelerator Marek Rabinski, Krzysztof Zdunek
7 pages
DOI: 10.1615/HighTempMatProc.v6.i1.50
THIN FILMS OF SILICON COMPOUNDS DEPOSITED BY PE-CVD AT ATMOSPHERIC PRESSURE Krzysztof Schmidt-Szalowski, Z. Rzanek-Boroch, J. Sentek, Z. Rymuza, Z. Kusznierewicz, M. Misiak
12 pages
DOI: 10.1615/HighTempMatProc.v6.i1.60
PROPERTIES OF SOME GLASS-CERAMICS IN MOLTEN AND SOLID STATE
12 pages
DOI: 10.1615/HighTempMatProc.v6.i1.70
INVESTIGATION OF INTERACTION OF OXYGEN WITH HALIDE MELT
4 pages
DOI: 10.1615/HighTempMatProc.v6.i1.80
INVESTIGATION OF OXYGEN ELECTROREDUCTION AT THE Pt(O2) ELECTRODE IN MOLTEN ALKALI CHLORIDES
9 pages
DOI: 10.1615/HighTempMatProc.v6.i1.90
TRANSPORT REACTIONS IN SALT MELTS AND THEIR APPLIED ASPECTS
8 pages
DOI: 10.1615/HighTempMatProc.v6.i1.100
ON THE ELECTROCRYSTALLIZATION OF REFRACTORY METALS IN A MELT OF NaCl-KCl-NaF-MeClx
17 pages
DOI: 10.1615/HighTempMatProc.v6.i1.110
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