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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v1.i4.70
pages 485-492

EXCITED SPECIES AND C-ATOM DENSITY DOWNSTREAM AN Ar PLASMA TORCH WITH OLEFINS (CH4, CF4) IN IMPURITY

Andre Ricard
Universite de Toulouse; UPS, INPT; LAPLACE (Laboratoire Plasma et Conversion d'Energie), Bat. 3R2, 118 route de Narbonne, F-31062 Toulouse cedex 9, France; CNRS, LAPLACE, F-31062 Toulouse, France
S. Al Ayoubi
Laboratoire Genie Precedes Plasmas - ENSCP 11, rue Pierre et Marie Curie - 75005 Paris- France
S. Cavadias
Laboratoire Genie Precedes Plasmas - ENSCP 11, rue Pierre et Marie Curie - 75005 Paris- France
Jacques Amouroux
Laboratoire de Genie des Precedes Plasmas Universite P. et M. Curie, ENSCP 11 rue P. et M. Curie 75005 Paris France

ABSTRACT

Excited species in an Ar plasma torch (40 MHz, 3 kW) with hydro- and halo-carbons in impurity have been analysed by emission spectroscopy. Two types of quantitative results have been obtained. The first one concerns the vibrational temperature of radicals. The vibrational temperatures of C2 and CN molecules have been found to increase from 4 to 6 × 103 K when going from an Ar-l%o CH4 to an Ar – l%o CF4 gas mixture. Such temperature values are a first step to analyse the departure to LTE inside the plasma jet and to appreciate the stabilization of HF molecule produced in Ar-H2-CF4 plasma torch. A second quantitative result is the determination of C-atom in impurity in the post-discharge of Ar-CH4 plasma torch. The C-atom density determined in a post-discharge tube by chemiluminescent reaction with N atoms, at a time of 3 × 10−2 sec. after the Ar plasma torch, was found in the order of 1019 m−3 with 10−3 CH4 into Ar, that is the ppm range (10-6 ratio of the total density).


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