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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN En Línea: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v3.i1.40
pages 39-50

ABOUT ROTATIONAL TEMPERATURE MEASUREMENTS AND THERMODYNAMIC EQUILIBRIUM IN RF GLOW DISCHARGES

Spyros Stamou
Plasma Chemistry Department of Chemical Engineering, University of Patras P.O.Box 1407, 26500, Patras, Greece
Dimitris Mataras
Plasma Technology Laboratory -Dept. of Chem. Engineering-University of Patras, P.O.Box 1407, 26500 Patra, Greece
Dimitrious E. Rapakoulias
Plasma Technology Lab, Dept. Chem. Engineering, University of Patras, P.O.Box 1407, 26500 Patra, Greece

SINOPSIS

The rotational temperature of the А2Δ excited state of SiH has been determined in a silane r.f. glow-discharge by optical emission spectroscopy, using both a revised Boltzman diagram method and a detailed simulation of the emission spectrum utilising a least squares fitting (LSF) method. It is shown here that the LSF is more reliable and a careful use can lead to accurate results. This is accomplished by using an improved term value formula and an optimisation of the set of constants are used to calculate the best possible simulation of the spectrum. On the other hand, important informations about the achievement of thermodynamic equilibrium are obtained, with the use of the Boltzman plot method. It is shown that the population distribution in the rotational levels of a short-lived electronic state is well described by Boltzman statistics. In both methods, the experimentally determined FWHM of the optical system is of major importance.


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