STRUCTURE AND MECHANICAL PROPERTIES OF Nb&minus;Al&minus;N NANOCOMPOSITE FILMS AS A FUNCTION OF THE DEPOSITION PARAMETERS

Volodymyr I. Ivashchenko; Vladyslav  Rogoz; Pavlo  Skrynskiy; Czeslaw  Kozak; Marek Opielak

doi:10.1615/HighTempMatProc.2016015994

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Editor en Jefes: Valiantsin M. Astashynski (open in a new tab) Andrey V. Gusarov (open in a new tab)

Editor Asociado: Nikolai N. Cherenda (open in a new tab)

Publicado 4 números por año

ISSN Imprimir: 1093-3611

ISSN En Línea: 1940-4360

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STRUCTURE AND MECHANICAL PROPERTIES OF Nb−Al−N NANOCOMPOSITE FILMS AS A FUNCTION OF THE DEPOSITION PARAMETERS

Volumen 19, Edición 2, 2015, pp. 179-187

DOI: 10.1615/HighTempMatProc.2016015994

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Volodymyr I. Ivashchenko
Department of Physical Material Science of Refractory Compounds, Frantsevich Institute for Problems of Materials Science National Academy of Science Ukraine (NASU), Kiev, Ukraine; Faculty of Material Science and Technology in Trnava, Slovak University of Technology in Bratislava, Trnava, Slovakia

Vladyslav Rogoz
Sumy State University, 2, Rimsky-Korsakov Str., Sumy, 40000, Ukraine; NanoBioMedical Center, Adam Mickiewicz University in Poznan, 85, Umultowska Str., Poznan, Poland

Pavlo Skrynskiy
Institute for Problems of Material Science, National Academy of Sciences of Ukraine, 3, Krzhyzhanovsky Str., Kiev, 03680, Ukraine

Czeslaw Kozak
Department of Electrical Devices and High Voltage Technology, Lublin University of Technology, 38D, Nadbystrzycka Str., 20-618 Lublin, Poland

Marek Opielak
Institute of Transport, Combustion Engines and Ecology, Lublin University of Technology, 36, Nadbystrzycka Str., 20-618 Lublin, Poland

SINOPSIS

Nb−Al−N films were deposited by magnetron sputtering of Nb and Al in an atmosphere of Ar−N₂ onto silicon wafers, at different currents of magnetron power supply, on which an aluminum (I_Al) target is mounted. The films were studied by X-ray diffractometry, nano- and microindentation. The size of nanocrystals, microstrain, nanohardness, and the elastic modulus are extremely dependent on I_Al. The films exhibit nanohardness and Knoop hardness in the range 29−33.5 GPa and 46−48 GPa, respectively.

PALABRAS CLAVE: Nb-Al-N, X-ray diffractometry, nanohardness

CITADO POR

Belovol K.O., Demianenko A.A., Structural features and physical and mechanical properties of AlN-TiB<inf>2</inf>-TiSi<inf>2</inf> amorphous and nanocomposite films, 2017 IEEE 7th International Conference Nanomaterials: Application & Properties (NAP), 2017. Crossref
Lisovenko M.O., Bondar O.V., Opielak M., Beresnev V.M., Konarski P., Sakenova R.E., Konstantinov S.V., Komarov F. F., Structure and properties of nanoscale MoN/CrN multilayered coatings, 2017 IEEE 7th International Conference Nanomaterials: Application & Properties (NAP), 2017. Crossref

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