Suscripción a Biblioteca: Guest
Portal Digitalde Biblioteca Digital eLibros Revistas Referencias y Libros de Ponencias Colecciones
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN En Línea: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v9.i1.120
pages 141-157

HIGH-RATE SILICON NITRIDE DEPOSITION FOR PHOTOVOLTAICS: FROM FUNDAMENTALS TO INDUSTRIAL APPLICATION

W.M.M. Kessels
Dept. of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, The Netherlands
P. J. van den Oever
Dept. of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, The Netherlands
R.C.M. Bosch
OTB Engineering B.V., P.O. Box 7108, 5605 JC, Eindhoven, The Netherlands
M.D. Bijker
OTB Engineering B.V., P.O. Box 7108, 5605 JC, Eindhoven, The Netherlands
M. Evers
OTB Engineering B.V., P.O. Box 7108, 5605 JC, Eindhoven, The Netherlands
D. C. Schram
Dept. of Applied Physics, Eindhoven University of Technology, P.O. Box 513, 5600 MB, Eindhoven, The Netherlands
M.C.M. van de Sanden
Eindhoven University of Technology, Department of Applied Physics, Den Dolech 2, 5600 MB Eindhoven, The Netherlands

SINOPSIS

The development of a novel plasma technique for high rate (> 1 nm/s) silicon nitride deposition for multifunctional antireflection coatings on crystalline silicon solar cells is described. The research has involved the analysis of the structural and optical properties of the silicon nitride films as obtained under different operating conditions using the N2-SiH4 and NH3-SiH4 reactant mixture. Furthermore, the fundamental plasma processes and the film growth mechanism have been studied in terms of plasma chemistry, plasma species, and their contribution to film growth. The feasibility of the application of the high-rate deposited silicon nitride as a bulk passivating antireflection coating has been proven by lab-scale experiments on multicrystalline silicon solar cells and the successful transfer of the technique into an industrial inline deposition system for high-volume production of solar cells is reported.


Articles with similar content:

NOVEL NANOSCALE HIGH ENERGETIC MATERIALS: NANOSTRUCTURED POLYMERIC NITROGEN AND POLYNITROGEN
International Journal of Energetic Materials and Chemical Propulsion, Vol.7, 2008, issue 5
Hakima Abou-Rachid, Anguang Hu, David Arato, Xueliang Sun, Sylvain Desilets
NEW SURFACE LAYER FORMATION BY ION ASSISTED REACTION (IAR) AND OPTIMUM PLASMA ZONE (OPZ)
Proceedings of an International Conference on Mitigation of Heat Exchanger Fouling and Its Economic and Environmental Implications, Vol.0, 1999, issue
Byung Ha Kang, Ki-Hwan Kim, Seok-Keun Koh, Samchul Ha
SYNTHESIS OF KESTERITE LAYERS OBTAINED BY SULFURIZATION OF ELECTRODEPOSITED METAL PRECURSORS
Telecommunications and Radio Engineering, Vol.74, 2015, issue 5
G.S. Khrypunov, N. P. Klochko, V.M. Lyubov, A.V. Momotenko, V. R. Kopach
HYDROTHERMAL SYNTHESIS AND CHARACTERIZATION OF Co0.5Zn0.5Fe2O4 NANOMATERIAL AND EVALUATION OF ITS PHOTOCATALYTIC ACTIVITY UNDER VISIBLE-LIGHT IRRADIATION
Nanoscience and Technology: An International Journal, Vol.6, 2015, issue 3
Muhammad Shahzad Saeed, Adil Raza, Ahmed Azam, Muhammad Ahsan
NUMERICAL SIMULATION OF THE DEPOSITION PROCESS AND THE EPITAXIAL GROWTH OF CADMIUM TELLURIDE THIN FILM IN A MOCVD REACTOR
Computational Thermal Sciences: An International Journal, Vol.5, 2013, issue 3
Vincent Barrioz, Xiaobing Huang, Shafiul Monir, Yiyi Wu, Giray Kartopu, Xiaogang Yang, Stuart J. C. Irvine