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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Publicado 4 números por año

ISSN Imprimir: 1093-3611

ISSN En Línea: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

Indexed in

Volumen 15, 2011 Edición 4

DOI: 10.1615/HighTempMatProc.v15.i4

EXERGY ANALYSIS OF A DC PLASMA SPRAYING OF POLYMER/Al2O3 COMPOSITE COATING K. Y. Tufa, D. Gravelle, Francois Gitzhofer
pp. 259-265
DOI: 10.1615/HighTempMatProc.v15.i4.10
THERMAL PLASMA TECHNIQUE FOR PRODUCTION OF DOPED LANTHANUM CHROMITE POWDERS FOR SEMICONDUCTING REFRACTORY CERAMICS A. V. Gorbunov, A. L. Mosse, A. Marotta, A. N. Knak
pp. 267-273
DOI: 10.1615/HighTempMatProc.v15.i4.20
EVAPORATION OF ZIRCONIA IN AN INDUCTIVELY COUPLED PLASMA Gunter Lins , David W. Branston
pp. 275-281
DOI: 10.1615/HighTempMatProc.v15.i4.30
TEMPERATURE DISTRIBUTION IN A PLASMA PILOT REACTOR FOR CARBON BLACK PRODUCTION Frederic Fabry, Benjamin Ravary, Ph. Bertrand, J. M. Badie, L. Fulcheri, Gilles Flamant, I. Yu. Smurov
pp. 283-291
DOI: 10.1615/HighTempMatProc.v15.i4.40
PLASMA-ASSISTED DEPOSITION OF NANOSTRUCTURED FILMS AND COATINGS Steven L. Girshick
pp. 293-298
DOI: 10.1615/HighTempMatProc.v15.i4.50
PLASMA CHEMICAL SYNTHESIS OF FINE MoSi2 AND MoSi2-Si3N4 COMPOSITE POWDERS A. Orlov , J. Grabis
pp. 299-306
DOI: 10.1615/HighTempMatProc.v15.i4.60
ENERGETIC PROPERTIES OF THE EXTENDED NEGATIVE GLOW IN THE IMPEDED N2 DISCHARGE A. A. Gilev, A. M. Gurianov, A. V. Manko, V.I. Zyn
pp. 307-312
DOI: 10.1615/HighTempMatProc.v15.i4.70
MATERIALS FOR THE PLASMA-INTERACTIVE COMPONENTS OF FUSION DEVICES H. Bolt, H. Maier
pp. 313-320
DOI: 10.1615/HighTempMatProc.v15.i4.80
POSSIBILITY OF COMPOSITE SILICON NITRIDE + SILICON CARBIDE (Si3 N4SiC) POWDER PRODUCTION IN THERMAL PLASMA Zivota G. Kostic, Predrag Lj. Stefanovic, Pavle B. Pavlovic, Dejan B. Cvetinovic
pp. 321-328
DOI: 10.1615/HighTempMatProc.v15.i4.90
COLD ELECTRODE EROSION MODEL FOR UNSTEADY ARC SPOTS L. I. Sharakhovsky, A. Marotta, V. I. Krylovich, V. N. Borisyuk, A. M. Essiptchouk
pp. 329-335
DOI: 10.1615/HighTempMatProc.v15.i4.100
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