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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Imprimer: 1093-3611
ISSN En ligne: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v10.i4.110
pages 603-616

INFLUENCE OF PLASMA TREATMENTS ON THE PROPERTIES OF SnOx THIN FILMS

Daniya M. Mukhamedshina
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
N. B. Beisenkhanov
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
K. A. Mit'
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
V. A. Botvin
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
I. V. Valitova
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
E. A. Dmitrieva
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan

RÉSUMÉ

The influence of treatment by glow discharge hydrogen and oxygen plasma on properties of undoped SnOxthin films has been studied. Films of ∼ 350−400 nm thick have been deposited on a glass substrate by magnetron sputtering in an argon-oxygen atmosphere. The dependences of structural, electrical and optical properties of SnOx films on plasma processing time have been investigated. The results are discussed in terms of SnOx thin films microstructure.


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