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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimer: 1093-3611
ISSN En ligne: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Acheter le numéro $293.00 Volume 20, 2016 Numéro 4

DOI: 10.1615/HighTempMatProc.v20.i4

Table des matières:

EFFECT OF MOLECULES IN RADIATIVE EMISSION FROM THE THERMAL PLASMAS OF CH4−H2 MIXTURES
S. Ailas, B. Liani, A. Karim Ferouani
pages 279-294
DOI: 10.1615/HighTempMatProc.2016017885
MODIFICATION OF THE SILUMIN STRUCTURE AND PROPERTIES BY ELECTRON−ION-PLASMA SATURATION OF THE SURFACE WITH ATOMS OF METALS AND GASES
Yurii F. Ivanov, Nikolay N. Koval, E. A. Petrikova, A. P. Laskovnev, Vladimir V. Uglov, Nikolai N. Cherenda
pages 295-307
DOI: 10.1615/HighTempMatProc.2017019271
LOW-TEMPERATURE PLASMA SOURCE BASED ON A COLD HOLLOW-CATHODE ARC WITH INCREASED SERVICE LIFE
Vladimir V. Denisov, Yury Akhmadeev, Nikolay N. Koval, E. V. Ostroverkhov
pages 309-316
DOI: 10.1615/HighTempMatProc.2016019390
EFFECT OF PLASMA STATE AND ALLOYING ADDITION ON REDUCTION OF Fe2O3 BY A LOW-TEMPERATURE HYDROGEN PLASMA
Priyanka Rajput, B. Bhoi, R. K. Paramguru, B. K. Mishra
pages 317-332
DOI: 10.1615/HighTempMatProc.2017019753
INDEX FOR VOLUME 20, 2016
pages 355-360
DOI: 10.1615/HighTempMatProc.v20.i4.60