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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Publication de 4  numéros par an

ISSN Imprimer: 1093-3611

ISSN En ligne: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

Indexed in

Volume 11, 2007 Numéro 3

DOI: 10.1615/HighTempMatProc.v11.i3

INVESTIGATION OF IN-FLIGHT PARTICLE CHARACTERISTICS AND MICROSTRUCTURAL EFFECTS ON OPTICAL PROPERTIES OF YSZ PLASMA-SPRAYED COATINGS V. Debout, Armelle Vardelle, P. Abelard, Pierre Fauchais, Erick Meillot, E. Bruneton, Franck Enguehard, S. Schelz
pp. 309-320
DOI: 10.1615/HighTempMatProc.v11.i3.10
OPEN POROUS METALLIC FOAMS WITH THERMAL BARRIER COATINGS AND COOLING HOLE ARRAY FOR HIGH TEMPERATURE TURBINE APPLICATIONS S. Angel, E. Ratte, W. Bleck, K. Bobzin, Erick Lugscheider, R. Nickel, K. Richardt, N. Bagcivan, K. Walther, E. W. Kreutz, I. Kelbassa, Reinhart Poprawe
pp. 321-343
DOI: 10.1615/HighTempMatProc.v11.i3.20
CHEMICAL REACTIONS IN HEAT AND MASS TRANSFER BETWEEN SMALL PARTICLES AND PLASMA Jacques Amouroux, Sergey V. Dresvin, D. Ivanov
pp. 345-358
DOI: 10.1615/HighTempMatProc.v11.i3.30
ELECTROMAGNETIC AND GAS DYNAMIC CONTROL OF TRANSFERRED PLASMA ARC IN METALLURGICAL PLASMA REACTORS AND FURNACES Mihail K. Mihovsky, V. Hadzhiyski, L. Todorov
pp. 359-369
DOI: 10.1615/HighTempMatProc.v11.i3.40
QUASI-ONE-DIMENSIONAL APPROACH TO THE FALLING FILM REACTOR FOR THE PLASMA-BASED SMELTING- REDUCTION OF THE IRON ORE P.P. Ivanov, E. Kh. Isakaev, Oleg A. Sinkevich
pp. 371-381
DOI: 10.1615/HighTempMatProc.v11.i3.50
SURFACE ALLOYING OF METALS USING A QUASI-STATIONARY PLASMA ACCELERATOR Vladimir V. Uglov, Nikolai N. Cherenda, V. M. Anishchik, A. K. Stalmashonak, A. G. Kononov, Yu. A. Petuhov, V. M. Astashinski, Anton M. Kuzmitski
pp. 383-391
DOI: 10.1615/HighTempMatProc.v11.i3.60
OSCILLATORY MOTION OF MAGNETICALLY DRIVEN ARC IN NON-UNIFORM FIELD I. Kuno, T. Yamamoto, Koichi Takeda, Takehiko Toh, Jim Tanaka, Ken-ichi Yamamoto, Sunao Takeuchi
pp. 393-403
DOI: 10.1615/HighTempMatProc.v11.i3.70
AN INVERSE METHOD FOR THE EXPERIMENTAL CHARACTERIZATION OF AN ANODE MATERIAL − HEAT FLUX AND TEMPERATURE FIELD M. Masquere, P. Freton, J. J. Gonzalez
pp. 405-419
DOI: 10.1615/HighTempMatProc.v11.i3.80
INVESTIGATION OF RADIAL ENERGY FLOWS IN AN ARC HEATER CHANNEL J. Gregor, I. Jakubova, J. Senk
pp. 421-430
DOI: 10.1615/HighTempMatProc.v11.i3.90
SHEATH CHARACTERISTICS OF AN EXCIPLEX XE-NE-HCL LAMP PUMPED BY PHOTO TRIGGERED DISCHARGE S. Bendella, Ahmed Belasri
pp. 431-441
DOI: 10.1615/HighTempMatProc.v11.i3.100
COLOR SEGREGATION IN METAL-HALIDE LAMPS: EXPERIMENTAL AND NUMERICAL INVESTIGATIONS W. J. M. Brok, T. Nimalasuriya, A. Hartgers, M. L. Beks, M. Haverlag, W. W. Stoffels, Joost J. A. M. van der Mullen
pp. 443-454
DOI: 10.1615/HighTempMatProc.v11.i3.110
MEASURING ELECTRIC FIELDS WITH LASER-INDUCED FLUORESCENCE-DIP STARK SPECTROSCOPY E. Wagenaars, M.D. Bowden, G. M. W. Kroesen
pp. 455-465
DOI: 10.1615/HighTempMatProc.v11.i3.120
INFLUENCE OF NEGATIVE SUBSTRATE BIAS ON PLASMA PROPERTIES AND SILICON FILM DEPOSITION RATE E. Katsia, P. Gkotsis, Dimitrious E. Rapakoulias
pp. 467-475
DOI: 10.1615/HighTempMatProc.v11.i3.130
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