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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Publication de 4  numéros par an

ISSN Imprimer: 1093-3611

ISSN En ligne: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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THIN FILMS OF SILICON COMPOUNDS DEPOSITED BY PE-CVD AT ATMOSPHERIC PRESSURE

Volume 6, Numéro 1, 2002, 12 pages
DOI: 10.1615/HighTempMatProc.v6.i1.60
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RÉSUMÉ

A new PE-CVD process for the thin coating manufacturing, using electric discharges at atmospheric pressure stabilized with a dielectric barrier (DBD), has been developed on a laboratory scale. Studying the polycondensation of hexamethyldisilazane (HMDSN) and tetraethoxysilicon (TEOS) uniform films, of a thickness of 10 - 200 nm, were obtained with silicon oxynitride or dioxide as the main components and with residues of organic components. The films were stable, smooth and strong adhering to the substrate. Their composition under various experimental conditions was determined by means of FT-IR and XPS spectroscopy, and their mechanical properties were studied. Laboratory models of reactors for thin films deposition under DBD conditions at atmospheric pressure were described.

CITÉ PAR
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