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International Journal for Multiscale Computational Engineering

Publication de 6  numéros par an

ISSN Imprimer: 1543-1649

ISSN En ligne: 1940-4352

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 1.4 To calculate the five year Impact Factor, citations are counted in 2017 to the previous five years and divided by the source items published in the previous five years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) 5-Year IF: 1.3 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 2.2 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00034 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.46 SJR: 0.333 SNIP: 0.606 CiteScore™:: 3.1 H-Index: 31

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OVERALL ELASTIC PROPERTIES OF POLYSILICON FILMS: A STATISTICAL INVESTIGATION OF THE EFFECTS OF POLYCRYSTAL MORPHOLOGY

Volume 9, Numéro 3, 2011, pp. 327-346
DOI: 10.1615/IntJMultCompEng.v9.i3.50
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RÉSUMÉ

In this paper we investigate the effects of polycrystal morphology on the overall properties of polysilicon. Focusing on two-dimensional representative volume elements (RVEs) of textured films, we numerically generate digital polycrystal morphologies through Voronoi tessellations and assume the in-plane orientation of the crystal lattice of silicon grains to be randomly distributed. First, we show how a regularization provision for the Voronoi tessellations, adopted in order to better match the grain boundary (GB) geometry featured by actual polysilicon films, affects the statistics of an internal length-scale which naturally emerges because of the presence of GBs. Second, we provide a numerical homogenization technique to estimate the overall in-plane elastic moduli of the polysilicon film and compare the outcomes with standard Voigt and Reuss bounds. Through this comparison, we furnish a way to also estimate the size of the RVE to get effective results. Third, through Monte Carlo simulations we investigate the effect of microstructural fluctuations on the scattering of the overall elastic moduli of polysilicon. We show that even when the RVE appears to be representative for a single polycrystal realization, the RVE might not be representative if one looks at the extreme values of the aforementioned scattered elastic moduli.

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