RT Journal Article
ID 24cfd91e13230d54
A1 Amouroux, Jacques
A1 Dresvin, Sergey V.
A1 Ivanov, D.
T1 CHEMICAL REACTIONS IN HEAT AND MASS TRANSFER BETWEEN SMALL PARTICLES AND PLASMA
JF High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
JO HTM
YR 2007
FD 2007-11-26
VO 11
IS 3
SP 345
OP 358
AB Our goal is to qualify the chemical reaction mechanisms which take place during the interaction between a RF air plasma and silicon particles.
The energy and mass transfer in the usual model take into account heat transfer from plasma by conduction and convection on the surface of the particle, radiation effect, melting, heating of vapor cloud and vaporization. So that heat and mass balance give us the possibility of modeling these processes. However exothermic reactions are able to appear between oxygen atoms and silicon which give SiO gas and strong enthalpy effect.
These mechanisms of chemical reactions between the air plasma and the silicon particles depend mainly of the plasma temperature and of the gas flow velocity. We propose to discuss the main results of this model in order to take into account the chemical mechanisms which appear on the surface plasma−powder.
PB Begell House
LK https://www.dl.begellhouse.com/journals/57d172397126f956,4a8f52230e1208e6,24cfd91e13230d54.html