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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

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Table of Contents:

THIN-FILM TECHNOLOGY FOR CREATING FLEXIBLE SUPERCAPACITOR ELECTRODES BASED ON A CARBON MATRIX
V. Sleptsov, Anna Diteleva
pages 167-171
DOI: 10.1615/HighTempMatProc.2020035840
NANOSTRUCTURING OF THE POLYETHYLENETEREPHTHALATE SURFACE USING ION-PLASMA TECHNOLOGY WITH THE HELP OF FLUORINE-CONTAINING GAS MIXTURES
Vera M. Elinson, Pavel A. Shchur, A. N. Lyamin
pages 173-182
DOI: 10.1615/HighTempMatProc.2020035843
INTRINSIC GETTERING IN SILICON SUBSTRATE OF MOS STRUCTURES UNDER COMBINED INFLUENCE OF RADIATION AND PULSED MAGNETIC FIELDS
Dmitrii V. Andreev, Vladimir M. Maslovsky, Mark N. Levin, Vladimir V. Andreev, Victor N. Murashev
pages 183-191
DOI: 10.1615/HighTempMatProc.2020035879
THERMAL STABILITY OF HARD TANTALUM BORIDE FILMS
Jindrich Musil, R. Čerstvý, Alexander D. Pogrebnjak
pages 193-200
DOI: 10.1615/HighTempMatProc.2020035911
FABRICATION OF BINARY SILICON-BASED NANOCRYSTALS BY PLASMA AND LASER-INDUCED CHEMISTRY IN SOLUTION
N. Tarasenka, Alena A. Nevar, E. Shustova, V. Kornev, M. I. Nedelko, Nikolai V. Tarasenko
pages 201-209
DOI: 10.1615/HighTempMatProc.2020036345
STRUCTURE OF THE AUSTENITIC STEEL SURFACE LAYER SUBJECTED TO COMPRESSION PLASMA FLOWS IMPACT
Nikolai N. Cherenda, Vladimir V. Uglov, Yu. V. Martinovich, I. A. Betanov, Valiantsin M. Astashynski, A. M. Kuzmitski
pages 211-225
DOI: 10.1615/HighTempMatProc.2020036411