High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
Published 4 issues per year
ISSN Print: 1093-3611
ISSN Online: 1940-4360
IF:
0.4
Immediacy Index:
0.1
Eigenfactor:
0.00005
JCI:
0.07
SJR:
0.198
SNIP:
0.48
CiteScore™::
1.1
H-Index:
20
Indexed in
Volume 2, 1998 Issue 1
DOI: 10.1615/HighTempMatProc.v2.i1
RADIATION EMISSION OF THERMAL PLASMA IN 02, H2O, C02 AND AIR
pp. 1-14
DOI: 10.1615/HighTempMatProc.v2.i1.10
PERIODIC LIGHT PERTURBATION IN AN ARGON DISCHARGE AT ATMOSPHERIC PRESSURE
pp. 15-24
DOI: 10.1615/HighTempMatProc.v2.i1.20
RELATION BETWEEN THE FLOW REGIME OF A PLASMA TORCH AND ITS ACOUSTIC BEHAVIOR
pp. 25-33
DOI: 10.1615/HighTempMatProc.v2.i1.30
LARGE AMPLITUDE OSCILLATIONS IN ELECTRIC ARCS SUSTAINED ON HETEROGENEOUS ELECTRODES IN GASEOUS ATMOSPHERE
pp. 35-47
DOI: 10.1615/HighTempMatProc.v2.i1.40
DYNAMIC BEHAVIOUR OF A NITROGEN D.C. TRANSFERRED DOUBLE ARC
pp. 69-81
DOI: 10.1615/HighTempMatProc.v2.i1.60
CHARACTERIZATION OF COMPLEX DYNAMICAL REGIMES, UP TO SPATIO-TEMPORAL CHAOS, IN PLASMAS
pp. 103-115
DOI: 10.1615/HighTempMatProc.v2.i1.80
NATURE OF ARGON AND NITROGEN ELECTRIC ARC FLUCTUATIONS IN PLASMA TORCH
pp. 117-128
DOI: 10.1615/HighTempMatProc.v2.i1.90
TRANSIENT THREE DIMENSIONAL SIMULATION OF ELECTRIC ARC
pp. 129-142
DOI: 10.1615/HighTempMatProc.v2.i1.100
STRUCTURE AND PROPERTIES OF CARBON AND HYDROCARBON FILMS DEPOSITED IN PLASMA OF LOW-PRESSURE ARC AND UNBALANCED DC MAGNETRON
pp. 143-154
DOI: 10.1615/HighTempMatProc.v2.i1.110
A SIMPLIFIED COMPUTATION OF THE ELECTRICAL CHARACTERISTICS OF A RF INDUCTION PLASMA
pp. 155-163
DOI: 10.1615/HighTempMatProc.v2.i1.120
Latest Issue
DETERMINATION OF THE MASS BALANCE OF HIGH-CARBON FERROCHROME IN A SUBMERGED ARC FURNACE
RHEOLOGICAL BEHAVIOR AND 3D PRINTING OF HIGHLY FILLED ALUMINA-POLYAMIDE FILAMENTS DURING FUSED DEPOSITION MODELING
SCRATCH TESTING OF ZrN COATING ON TI-6AL-4V TITANIUM ALLOY SURFACE PRELIMINARY TREATED BY COMPRESSION PLASMA FLOWS IMPACT
ELECTRON-BEAM SINTERING OF ZIRCONIUM DIOXIDE/TITANIUM CERAMICS FOR MICROELECTRONICS PRODUCTS
THE EFFECT OF THE FLUORINE CONCENTRATION IN A PLASMA-FORMING GAS MIXTURE ON THE CHEMICAL COMPOSITION, SURFACE CHARGE, AND RELIEF PARAMETERS OF FLUOROCARBON COATINGS ON PET
PREPARATION AND THERMOELECTRIC PROPERTIES OF p-TYPE Ag(1-x)Cu(1+x)Te SAMPLES BY SPARK PLASMA SINTERING METHOD
Forthcoming Articles
Increasing the wear resistance of titanium alloys by deposition of a modifying coating (Zr,Nb)N
Electron-beam synthesis of zirconia ceramic coatings in the forevacuum pressure range
Preparation and Thermoelectric Properties of P-type Ag(1-x)Cu(1+x)Te Samples by SPS Method
The effect of the fluorine concentration in a plasma-forming gas mixture on the chemical composition, surface charge and relief parameters of fluorocarbon coatings on PET
Electron beam sintering of zirconium dioxide/titanium ceramics for microelectronics products