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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v2.i4.60
pages 507-519

INVESTIGATIONS OF THE ELECTRODEPOSITION OF ALUMINUM-MANGANESE ALLOYS FROM ROOM TEMPERATURE CHLOROALUMINATE MOLTEN SALTS

ABSTRACT

The electrochemical reduction of manganese (II) in acidic AlCl3:EMIC (aluminum chloride: l-ethyl-3-methylimidazolium chloride) room temperature molten salt results in codeposition of aluminum and manganese. Constant potential deposition in the region of the reduction peak results in the deposition of manganese rich amorphous manganese-aluminum alloys. Constant potential deposition in the region of diffusion control results in the formation of aluminum rich amorphous manganese-aluminum alloys. We have employed an Electrochemical Quartz Crystal Microbalance (EQCM) to investigate, in situ, the deposition and stripping behavior of Al and Al-Mx in acidic AlCl3:EMIC molten salts. The EQCM provides both mass and charge data during electrodeposition and stripping processes. This information can be used to determine codeposited metal composition and to model deposition and/or stripping processes.


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