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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v1.i1.80
pages 97-107

QUANTITATIVE MEASUREMENT OF ATOMIC OXYGEN DENSITY IN A MICROWAVE GENERATED AIR PLASMA BY LASER INDUCED FLUORESCENCE

M. Balat
IMP-CNRS, Institut de science et de génie des Matériaux et Procédés IMP-CNRS, BP 5, 66125 Odeillo Cédex (France)
P. Peze
LPCA, Laboratoire de Physico-Chimie de l'Atmosphère, 145 rue du Pertuis d'Amont, 59140 Dunkerque (France)
M. Lebrun
IMP-CNRS, Institut de science et de génie des Matériaux et Procédés IMP-CNRS, BP 5, 66125 Odeillo Cédex (France)
J. Siffre
ONERA - CERT, 2 avenue Edouard Belin, BP 4025, 31055 Toulouse Cédex (France)

ABSTRACT

An air plasma diagnostic is done by Laser Induced Fluorescence (LIF) on the MESOX simulation test bench used to reproduce atmospheric reentry conditions. The parameters taken into account are the total air pressure (100 to 5000 Pa), the air flow rate (1.11 10−6 and 5.83 10−6 m3.s−1), the microwave power (300 and 600 W) and the distance from the discharge (5 and 15 cm). The results are an increase of the atomic oxygen concentration with pressure, and a decrease with the flow rate and the distance from the discharge.


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