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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Impact factor: 0.058
5-Year Impact Factor: 0.257

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Buy Issue $144.00 Volume 1, 1997 Issue 1

DOI: 10.1615/HighTempMatProc.v1.i1

Table of Contents:

THE APPLICATION OF DC PLASMA-ARC TECHNOLOGY TO EXTRACTIVE METALLURGICAL PROCESSING
N. A. Barcza
pages 1-15
DOI: 10.1615/HighTempMatProc.v1.i1.10
THE INDUCTIVELY COUPLED RADIO FREQUENCY PLASMA
Maher I. Boulos
pages 17-39
DOI: 10.1615/HighTempMatProc.v1.i1.20
INTEGRATED FABRICATION PROCESS FOR SOLID OXIDE FUELCELLS USING HYBRID PLASMA SPRAYING
Noriyuki Nomoto, Yoshitomi Okazaki, Kenji Kuroda, Shunji Takenoiri , Toyonobu Yoshida
pages 41-47
DOI: 10.1615/HighTempMatProc.v1.i1.30
Characterization of a vortex-stabilized arc plasma torch using simple power expressions
A. Marotta, L.O.M. da Silva
pages 49-53
DOI: 10.1615/HighTempMatProc.v1.i1.40
The Nature of Arc Cathode Spots
Burkhard Juettner
pages 55-71
DOI: 10.1615/HighTempMatProc.v1.i1.50
COMBINED BURNER WITH SUPERIMPOSED UNIPOLAR RADIO-FREQUENCY DISCHARGE
Jan Janca, J. Teply, C. Tesar, M. Dressler
pages 73-81
DOI: 10.1615/HighTempMatProc.v1.i1.60
Chemical Relaxation in Cooling Air Plasmas
E. Epifanie, J. Bacri, Jean-Philippe Sarrette, Anne-Marie Gomes
pages 83-95
DOI: 10.1615/HighTempMatProc.v1.i1.70
QUANTITATIVE MEASUREMENT OF ATOMIC OXYGEN DENSITY IN A MICROWAVE GENERATED AIR PLASMA BY LASER INDUCED FLUORESCENCE
M. Balat, P. Peze, M. Lebrun, J. Siffre
pages 97-107
DOI: 10.1615/HighTempMatProc.v1.i1.80
SURFACE TEMPERATURE MONITORING DURING PULSED LASER, ELECTRON BEAM AND PLASMA ACTION
M. Ignatiev, I. Yu. Smurov, Gilles Flamant, V. N. Senchenko, V. S. Dozhdikov
pages 109-123
DOI: 10.1615/HighTempMatProc.v1.i1.90
NUMERICAL SOLUTION OF ONE-DIMENSIONAL MELTING AND SOLIDIFICATION OF TWO-COMPONENT CERAMICS WITH COUPLED HEAT AND DIFFUSION MASS TRANSFER
S. Konstantinov, I. Yu. Smurov, Gilles Flamant
pages 125-132
DOI: 10.1615/HighTempMatProc.v1.i1.100
Saturated vapour of individual substance
O. Coufal, I. Vagera
pages 133-147
DOI: 10.1615/HighTempMatProc.v1.i1.110