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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v9.i2.130
pages 307-319

INFLUENCE OF HYDROGEN PLASMA TREATMENT ON THE STRUCTURE AND OPTICAL PROPERTIES OF TIN OXIDE THIN FILM PRODUCED BY MAGNETRON SPUTTERING

Daniya M. Mukhamedshina
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
N. B. Beisenkhanov
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
K. A. Mit'
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan
I.V. Valitova
Institute of Physics and Technology, Almaty, Republic of Kazakhstan
V. A. Botvin
Institute of Physics and Technology of the MES RK, Ibragimova street 11, Almaty 050032, Kazakhstan

ABSTRACT

The influence of glow discharge hydrogen plasma treatment on undoped tin dioxide thin films has been studied. The films with thickness of ∼ 350 nm have been prepared by a method of magnetron sputtering in argon-oxygen atmosphere on glass substrate. Temperature of the substrate was 200 °C. It has been shown that these films were amorphous just after fabrication; their polycrystalline structure was formed during annealing and it was worsened after processing in the hydrogen plasma. The dependences of structural and optical properties of SnOx films from various regimes of treatment by hydrogen plasma and the annealing in air at temperature of 550 °C have been investigated. The values of optical parameters, density and porosity of SnOx films after different regimes of treatment were found. Correlation between the structural and optical properties of tin oxide films is discussed.


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