Library Subscription: Guest
Begell Digital Portal Begell Digital Library eBooks Journals References & Proceedings Research Collections
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v9.i2.80
pages 263-267

SYNTHESIS AND PROPERTIES OF FULLERENE CONTAINED FILMS IN RF PLASMA

V. V. Azharonok
Institute of Physics of NAS of Belarus,68 Independence Av., 220072 Minsk
L. I. Filatova
Institute of Molecular and Atomic Physics of the National Academy of Sciences of Belarus, F.Skaryna Av., 70, Minsk, 220072, Belarus
V. D. Shimanovich
Institute of Molecular and Atomic Physics of NAS of Belarus, 70 Skaryna Av., 220072 Minsk, Belarus

ABSTRACT

The process of deposition of semitransparent fullerene contained composite films in a capacitively coupled rf discharge is investigated. The 5.28 MHz discharge is operated in a parallel plate reactor. As a working gas helium is used at pressure 0.5 ÷ 5 Torr. Carbon films are deposited on a quartz plate. Products of electric arc synthesis of fullerenes (a small-dispersed carbon soot containing fullerene C60 and C70) are used as an initial substance for making carbon films. The processes in the discharge are studied by emission spectroscopy methods. The gas kinetic temperature is measured in different zones of the discharge gap near the quartz substrate. Optical absorption properties and structure of obtained films are investigated using UV-VIS spectrophotometer and scanning electron microscope.


Articles with similar content:

PLASMA SPRAYED COATINGS OF MECHANOFUSED ALUMINA-STEEL PARTICLES
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.14, 2010, issue 4
Helene Ageorges, Alain Grimaud, Pierre Fauchais
OPTICAL EMISSION SPECTROSCOPY OF A SUPERSONIC LOW-PRESSURE PLASMA REACTOR USED TO SYNTHESIS SOFC CATHODES THIN LAYERS
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.10, 2006, issue 3
Jacques Amouroux, M. Nickravech, Daniel Morvan, F. Rousseau, S. Awamat
PLASMA SPRAYED COATINGS OF MECHANOFUSED ALUMINA-STEEL PARTICLES
Progress in Plasma Processing of Materials, 1999, Vol.1, 1999, issue
Helene Ageorges, Alain Grimaud, Pierre Fauchais
STRUCTURE AND PROPERTIES OF CARBON AND HYDROCARBON FILMS DEPOSITED IN PLASMA OF LOW-PRESSURE ARC AND UNBALANCED DC MAGNETRON
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.2, 1998, issue 1
V.P. Makarov , I.A. Anisimova, V.P. Anisimov, D.K. Otorbaev
SPECTROSCOPIC STUDY OF A HELIUM MICROWAVE DISCHARGE PRODUCED BY THE AXIAL INJECTION TORCH
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.8, 2004, issue 4
M.C. Quintero, R. Alvarez, Antonio Sola, Antonio Rodero, Antonio Gamero