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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Impact factor: 0.058
5-Year Impact Factor: 0.257

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Buy Issue $144.00 Volume 9, 2005 Issue 2

DOI: 10.1615/HighTempMatProc.v9.i2

Table of Contents:

FROM TRANSFERRED ARC TO PLASMA TORCHES
J. F. Coudert, C. Chazelas, D. Rigot, V. Rat
pages 173-194
DOI: 10.1615/HighTempMatProc.v9.i2.10
INFLUENCE OF SPRAY TECHNOLOGY ON IONIC CONDUCTIVITY OF YTTRIA STABILIZED ZIRCONIA
G. Renouard-Vallet, L. Bianchi, Pierre Fauchais, Michel Vardelle, Maher I. Boulos, Francois Gitzhofer
pages 195-209
DOI: 10.1615/HighTempMatProc.v9.i2.20
Fast modelling of plasma jet and particle behaviours in spray conditions
Guy Delluc, Helene Ageorges, Bernard Pateyron, Pierre Fauchais
pages 211-226
DOI: 10.1615/HighTempMatProc.v9.i2.30
STUDY OF THE PHASES FORMED DURING THE GROWTH OF THICK COATINGS WITH COARSE GRAINED TIN
G. Vourlias, N. Pistofidis, P. Patsalas, E. Pavlidou, G. Stergioudis, E. K. Polychroniadis
pages 227-236
DOI: 10.1615/HighTempMatProc.v9.i2.40
ARC PLASMA SYNTHESIS OF CARBON ENCAPSULATES CONTAINING Fe-Nd-B
M. Bystrzejewski, H. Lange, A. Huczko
pages 237-243
DOI: 10.1615/HighTempMatProc.v9.i2.50
DYNAMICS OF CARBON CLUSTER GROWTH IN DISCHARGE PLASMA WITH GRAPHITE ELECTRODES. THE PHYSICAL MODEL AND NUMERICAL SIMULATION
K. L. Stepanov, Yu. A. Stankevich, L. K. Stanchits
pages 245-251
DOI: 10.1615/HighTempMatProc.v9.i2.60
X-ray characterization of structural defects in electroexplosive nanopowders
Vladimir An, Alexander Ilyin, Charles de Izarra
pages 253-262
DOI: 10.1615/HighTempMatProc.v9.i2.70
SYNTHESIS AND PROPERTIES OF FULLERENE CONTAINED FILMS IN RF PLASMA
V. V. Azharonok, L. I. Filatova, V. D. Shimanovich
pages 263-267
DOI: 10.1615/HighTempMatProc.v9.i2.80
PASSIVATION OF POLYCRYSTALLINE SILICON BY HYDROGEN PLASMA : CHARACTERIZATION BY IMPEDANCE SPECTROSCOPY
S. Darwiche, M. Nikravech, Daniel Morvan, Jacques Amouroux, D. Ballutaud
pages 269-277
DOI: 10.1615/HighTempMatProc.v9.i2.90
TEOS/O2 GAS PRESSURE AS A CHEMICAL COMPOSITION ADJUSTER OF PLASMA DEPOSITED SIO2 THIN FILMS
A. Panou, Ch. Voulgaris, E. Amanatides, Dimitris Mataras, Dimitrious E. Rapakoulias
pages 279-285
DOI: 10.1615/HighTempMatProc.v9.i2.100
IN SITU LASER ASSISTED DIAGNOSTICS ON GROWTH RATE OF THICK PACVD ORGANOSILICON FILMS
P. Supiot, C. Vivien, M. Aimard, R. Sumera, B. Bocquet
pages 287-297
DOI: 10.1615/HighTempMatProc.v9.i2.110
RESULTS OF PRODUCTION TESTS AND ANALYSIS OF DESTRUCTION MECHANISMS OF HOT FORGING DIES COVERED BY THE COMPOSITE „NITRIDING LAYER/CrN COATING”
Jerzy Smolik, Jan Walkowicz, Rafal Brudnias, Carlos Bertrand, Carmen Montero
pages 299-306
DOI: 10.1615/HighTempMatProc.v9.i2.120
INFLUENCE OF HYDROGEN PLASMA TREATMENT ON THE STRUCTURE AND OPTICAL PROPERTIES OF TIN OXIDE THIN FILM PRODUCED BY MAGNETRON SPUTTERING
Daniya M. Mukhamedshina, N. B. Beisenkhanov, K. A. Mit', I.V. Valitova, V. A. Botvin
pages 307-319
DOI: 10.1615/HighTempMatProc.v9.i2.130