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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Impact factor: 0.058
5-Year Impact Factor: 0.257

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Buy Issue $168.00 Volume 11, 2007 Issue 4

DOI: 10.1615/HighTempMatProc.v11.i4

Table of Contents:

EXPRESS ANALYSIS OF PARAMETERS OF HIGH ENTHALPY PLASMA JETS
A. A. Belevtsev, V. F. Chinnov, E. Kh. Isakaev
pages 477-492
DOI: 10.1615/HighTempMatProc.v11.i4.10
PLASMA PROCESSING OF CONCRETE AND RELATED MATERIALS
B. Dzur
pages 493-503
DOI: 10.1615/HighTempMatProc.v11.i4.20
NEW FEEDING SYSTEM FOR PLASMA REACTOR "PLASMALAB" FOR REDUCTION PROCESSING OF DISPERSE RAW AND WASTE MATERIALS
Mihail K. Mihovsky, V. Hadzhiyski, L. Todorov
pages 505-513
DOI: 10.1615/HighTempMatProc.v11.i4.30
PROPERTIES OF ATMOSPHERIC PRESSURE GLOW DISCHARGE WITH LIQUID ELECTROLYTE CATHODE
V. A. Titov, V. V. Rybkin, S. A. Smirnov, A. L. Kulentsan, H.-S. Choi
pages 515-525
DOI: 10.1615/HighTempMatProc.v11.i4.40
THE INFLUENCE OF SOLUTION COMPONENT TRANSFER TO THE PLASMA ON GAS DISCHARGE PROPERTIES
A. I. Maximov, A. V. Khlyustova
pages 527-535
DOI: 10.1615/HighTempMatProc.v11.i4.50
COMPREHENSIVE MODIFICATION OF SEMICONDUCTORS AND METALS PROVIDING NEW STRUCTURAL FEATURES OF SURFACE LAYERS SUBJECTED TO COMPRESSION PLASMA FLOWS
V. M. Astashinski, S. I. Ananin, E. A. Kostyukevich, A. M. Kuzmitski, Vladimir V. Uglov, V. M. Anishchik, Nikolai N. Cherenda, A. K. Stalmashonak, Yu. V. Sveshnikov, N. T. Kvasov, A. L. Danilyuk, A. V. Punko
pages 537-548
DOI: 10.1615/HighTempMatProc.v11.i4.60
MODEL OF A PLASMA PHOTOELECTRIC CONVERTER WITH A THIN TRANSITION LAYER BETWEEN ALKALI VAPORS AND BUFFER GAS
N. A. Gorbunov, A. N. Kopitov, Gilles Flamant
pages 549-564
DOI: 10.1615/HighTempMatProc.v11.i4.70
IMPURITY COMPOSITION OF ATOMIC HYDROGEN BEAM FORMED BY A LOW-PRESSURE ARC-DISCHARGE SOURCE WITH SELF-HEATED CATHODE
V. A. Kagadei, D. I. Proskurovski, S. V. Romanenko
pages 565-573
DOI: 10.1615/HighTempMatProc.v11.i4.80
DIFFERENCES BETWEEN AMORPHOUS AND NANOSTRUCTURED SILICON FILMS AND THEIR APPLICATION IN SOLAR CELL
L. Raniero, I. Ferreira, E. Fortunato, R. Martins
pages 575-583
DOI: 10.1615/HighTempMatProc.v11.i4.90
MODELING OF PULSED CAPILLARY DISCHARGE WAVEGUIDES USING A NON-LTE APPROACH
B. H. P. Broks, Joost J. A. M. van der Mullen
pages 585-592
DOI: 10.1615/HighTempMatProc.v11.i4.100
THE MODIFICATION OF PAPER INDUCED BY RADIO FREQUENCY AND MICROWAVE PLASMA TREATMENT
V. V. Azharonok, I. I. Filatova, A. P. Dostanko, S. V. Bordusov, Yu. S. Shynkevich
pages 593-600
DOI: 10.1615/HighTempMatProc.v11.i4.110
PHOTOACOUSTIC DETERMINATION OF THERMAL CONDUCTIVITY OF ALUMINUM NANOPOWDERS
Vladimir An, Charles de Izarra
pages 601-609
DOI: 10.1615/HighTempMatProc.v11.i4.120
THE BURGERS EQUATION AS AN ELECTRODYNAMIC MODEL IN PLASMA PHYSICS
E. Moreau, Olivier Vallee
pages 611-617
DOI: 10.1615/HighTempMatProc.v11.i4.130
USING INTELLIGENT OPERATION OF A HIGH VOLTAGE CIRCUIT BREAKER TO IMPROVE ITS OPENING AND CLOSING CAPACITY
Xiaoning Chen, Patrick Siarry, Zhiying Ma, Yunsheng Zhang
pages 619-640
DOI: 10.1615/HighTempMatProc.v11.i4.140