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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN Print: 1093-3611
ISSN Online: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.2015013717
pages 117-125

PLASMA GENERATION IN A LOW-PRESSURE HOLLOW-CATHODE NON-SELF-SUSTAINED GLOW DISCHARGE

I. V. Lopatin
O.Ya. Usikov Institute for Radio Physics and Electronics, National Academy of Sciences of Ukraine, 12 Academician Proskura St., Kharkiv 61085, Ukraine
Yury Akhmadeev
Institute of High Current Electronics, Siberian Branch, Russian Academy of Sciences
Nikolay N. Koval
Institute of High Current Electronics, Siberian Branch of the Russian Academy of Sciences, 2/3 Akademichesky Ave., Tomsk, 634055, Russia; National Research Tomsk State University, 36 Lenin Ave., Tomsk, 634050, Russia
P. M. Schanin
Institute of High-Current Electronics, Siberian Branch, Russian Academy of Sciences, 4 Akademicheskii Ave., Tomsk, 634055, Russia

ABSTRACT

Research on a hollow-cathode non-self-sustained glow discharge demonstrates the feasibility of discharge operation at pressures from 0.1 Pa. Depending on experimental conditions, the discharge operating voltage can reach ~50 V, which is much lower than that of a self-sustained glow discharge in the same electrode system. The discharge current can range up to 30 A. The working gas is Ar, N2, and N-based gas mixtures. Probe measurements of the discharge plasma show that the electron temperature varies between 1.5 and 7 eV, depending on the pressure of gas and its kind, and the plasma density can reach 1011 cm−3 at 15-A currents. Nitriding in the discharge plasma at 600°C for 2 h made it possible to increase the hardness of Ti (VT1-0) 3.5 times and that of 12Cr18Ni10Ti three times, with a modified layer depth of 35 µm.


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