RT Journal Article ID 55a9d9940d932335 A1 Trassy, C. A1 Petit, F. A1 Diemiaszonek, R. A1 Fauchais, Pierre T1 CONTINUOUS MONITORING OF METAL VOLATILISATION IN A PLASMA FURNACE BY INDUCTIVELY COUPLED PLASMA EMISSION SPECTROMETRY JF High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes JO HTM YR 1997 FD 1997-12-20 VO 1 IS 4 SP 449 OP 460 K1 continuous emission monitoring; process control; inductively coupled plasma emission spectroscopy; gas control AB Several recent studies have shown that it is possible to use Inductively Coupled Plasma Optical Emission Spectroscopy (ICP-OES) in the online analysis of metals in flue gases produced by industrial processes. The limits of detection observed are very low, in the μg/m3 range. This technique has been used to monitor the gases in a plasma reactor devoted to treatment of fine dusts. It permitted us to follow the variations of metal concentrations in the gaseous phase and to evaluate the evaporation rate of various elements according to the reactor parameters. The response time of this technique is very fast, less than one minute in fact. The main difficulty is due to the changes in gas composition. These changes induce a variation in the method sensitivity. It results in errors in the measurement of the absolute concentrations. Solutions are proposed to overcome this difficulty. In spite of these disadvantages, such a method could be very useful in process control. PB Begell House LK https://www.dl.begellhouse.com/journals/57d172397126f956,685807dd3918a627,55a9d9940d932335.html