要約

Plasmas are indispensable in laser technology. For applications such as media for high power lasers, laser machining, quality monitoring, chemical analysis and high brightness short wavelength sources problems, solutions and results are discussed.
The plasmas involved cover a wide range of densities and temperatures. Light emission ranging from the far infrared to x-rays is used. CW operation on one hand and extremely short pulses on the other hand imply different temporal behaviour. Thus for each single application different physical domains are relevant and different fundamental physical processes dominate the interaction of the laser beam with the plasma.