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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.2020033164
pages 47-59

SIMULATION OF PARAMETERS OF EXCILAMPS EXCITED BY GLOW DISCHARGE

Alexander Volodenkov
Yanka Kupala State University of Grodno, 22 Ozheshko Str., Grodno, 230023, Belarus
Kazimir Znosko
Yanka Kupala Grodno State University, 22 Ozheshko Str., Grodno, 23 0023, Belarus
Slavomir Anufrick
Yanka Kupala Grodno State University, 22 Ozheshko Str., Grodno, 23 0023, Belarus

要約

The technique of modeling XeCl excilamp, excited by glow discharge (halogen donor Cl2), with a cylindrical radiator is developed. Computer modeling of XeCl excilamp excited by glow discharge is executed. Values of rate factors of reactions with participation of electrons were obtained by using the Bolsig+ software. The system of excitation on the basis of an LC-contour was used for obtaining the capacitance discharge. On using a storage capacity of 10 nF the energy of radiation pulse was 0.4 J. Power of radiation XeCl excilamp with a cylindrical radiator on binary mixtures Cl2:Xe on excitation by the glow discharge at frequency of pulses 100 Hz makes ~ 16 W at efficiency ~ 14%.

参考

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