High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
年間 4 号発行
ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360
IF:
0.4
Immediacy Index:
0.1
Eigenfactor:
0.00005
JCI:
0.07
SJR:
0.198
SNIP:
0.48
CiteScore™::
1.1
H-Index:
20
Indexed in
EFFECT OF MOLECULES IN RADIATIVE EMISSION FROM THE THERMAL PLASMAS OF CH4−H2 MIXTURES
巻 20,
発行 4, 2016,
pp. 279-294
DOI: 10.1615/HighTempMatProc.2016017885
要約
The paper presents a numerical model of the radiation escaping from the thermal plasma made of the mixtures of methane CH4 and hydrogen H2. This simulation is performed at L.T.E. (Local Thermodynamic Equilibrium) at atmospheric pressure in the temperature interval from 300 to 30,000 K. The total radiation plasmas obtained by the summation of all the contributions (atomic continuum, atomic lines, molecular continuum, and molecular bands) are described in detail. In this paper, we focus on the contribution by the molecular species. Several figures are proposed to illustrate the influence of these molecules depending on the temperature, pressure, and the plasma size.
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