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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v2.i1.110
pages 143-154

STRUCTURE AND PROPERTIES OF CARBON AND HYDROCARBON FILMS DEPOSITED IN PLASMA OF LOW-PRESSURE ARC AND UNBALANCED DC MAGNETRON

I.A. Anisimova
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
V.P. Anisimov
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
V.P. Makarov
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
D.K. Otorbaev
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic

要約

Amorphous hydrogenated carbon films were deposited in the plasma of a low-pressure arc discharge burning at the evaporating graphite electrode and in the plasma of a unbalanced magnetron sputtering discharge in different gas environments (Ar, CH4). The film structure was investigated by micro-diffraction method of transmission electron microscopy. Influence of the deposition technique and of the gas composition on the structure and on optical and electrical properties of the deposited films have been investigated.


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