High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
年間 4 号発行
ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360
IF:
0.4
Immediacy Index:
0.1
Eigenfactor:
0.00005
JCI:
0.07
SJR:
0.198
SNIP:
0.48
CiteScore™::
1.1
H-Index:
20
Indexed in
STRUCTURE AND PROPERTIES OF CARBON AND HYDROCARBON FILMS DEPOSITED IN PLASMA OF LOW-PRESSURE ARC AND UNBALANCED DC MAGNETRON
巻 2,
発行 1, 1998,
pp. 143-154
DOI: 10.1615/HighTempMatProc.v2.i1.110
要約
Amorphous hydrogenated carbon films were deposited in the plasma of a low-pressure arc discharge burning at the evaporating graphite electrode and in the plasma of a unbalanced magnetron sputtering discharge in different gas environments (Ar, CH4). The film structure was investigated by micro-diffraction method of transmission electron microscopy. Influence of the deposition technique and of the gas composition on the structure and on optical and electrical properties of the deposited films have been investigated.
キーワード: hydrocarbon films, plasma deposition
によって引用された
-
Huczko A., Lange H., Zhu Y. Q., Hsu W. K., Kroto H. W., Walton D. R. M., Non-thermal Plasma Synthesis of Nanocarbons, in Frontiers of Multifunctional Nanosystems, 2002. Crossref
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