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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

年間 4 号発行

ISSN 印刷: 1093-3611

ISSN オンライン: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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HEAT TRANSFER FROM OXYGEN ATOMS RECOMBINATION ON SILICON CARBIDE: CHEMICAL EVOLUTION OF THE MATERIAL SURFASE

巻 4, 発行 3, 2000, 14 pages
DOI: 10.1615/HighTempMatProc.v4.i3.50
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要約

In order to quantify the energy transfer from the reactive flow to a surface, determination of recombination and accommodation coefficients (respectively γ and β coefficients) is required. The following work concerns atomic oxygen flow recombining on silicon carbide. The γ coefficient is measured in a pulsed oxygen plasma reactor in non equilibrium conditions, using an actinometiic method, whereas the β coefficient is determined in a micro-wave plasma reactor, using a calorimetric method. The βγ coefficient gives also the energetic transfer to the surface during the recombination reaction. The experimental study is undertaken on silicon carbide which presents interesting properties as refractory material. The measurements are performed on a large temperature range (300 - 1123 K) in order to point out a change in the recombination mechanism when the surface temperature rises. At the same time, the chemical structure of the material is followed by different analysis techniques (ESCA, SIMS and SEM) and shows a modification of the chemical composition of silicon carbide resulting from oxidation, ablation of the surface and diffusion of oxygen into the bulk material.

によって引用された
  1. Guyon C., Cavadias S., Mabille I., Moscosa-Santillan M., Amouroux J., Recombination of oxygen atomic excited states produced by non-equilibrium RF plasma on different semiconductor materials: catalytic phenomena and modelling, Catalysis Today, 89, 1-2, 2004. Crossref

  2. Ueda S., Sato K., Komuro T., Tanno H., Itoh K., Kurotaki T., Surface temperature and pressure dependency of catalytic effects to flat plates in high enthalpy flow, in Shock Waves, 2005. Crossref

  3. Vesel A, Primc G, Zaplotnik R, Mozetič M, Applications of highly non-equilibrium low-pressure oxygen plasma for treatment of polymers and polymer composites on an industrial scale, Plasma Physics and Controlled Fusion, 62, 2, 2020. Crossref

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