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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v15.i3.70
pages 253-258

THERMAL PLASMA PROCESS FOR THE RECLAIMING OF CeO2-BASED GLASS POLISHING POWDERS

A. L. Mosse
Plasma Physics and Chemistry Laboratory, A. V. Luikov Heat and Mass Transfer Institute, National Academy of Sciences of Belarus, P.Brovka str. 15, 220072, Minsk, Belarus
A. V. Gorbunov
Plasma Physics and Chemistry Laboratory, A. V. Luikov Heat and Mass Transfer Institute, National Academy of Sciences of Belarus, Minsk, Belarus
A. G. Doroshkevitch
Institute of Optical Machinery and Vacuum Techniques, Minsk, Belarus
V. N. Ivanova
Institute of Optical Machinery and Vacuum Techniques, Minsk, Belarus

要約

The method for reclaiming of ceria-based glass polishing powders from the rare earth (RE) containing industrial wastes using thermal plasma processing of dispersed RE salts and solutions was developed. The most advantageous variant on plasma stage efficiency and on reclaiming schematic simplicity is observed to be the spray electric arc plasma processing of the concentrate nitrate solutions with surfactant. It result in as-prepared influorated powders (< 55% ceria in solid solution) with good polishing for some optical silicate glasses (polishing rate 40−51 mg / 30 min) and for hard mineral crystals.


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