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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.2016017252
pages 85-92

EFFECT OF THERMAL ANNEALING AND DEPOSITION CONDITIONS ON THE STRUCTURE AND MECHANICAL PROPERTIES OF A MULTILAYER NITRIDE COATING BASED ON Ta

Yaroslav O. Kravchenko
Sumy State University, 2 Rimsky Korsakov Str., Sumy, 40007, Ukraine
Olga Maksakova
Department of Nanoelectronic, Sumy State University, Sumy, Ukraine
Pawel Drodziel
Faculty of Mechanical Engineering, Lublin University of Technology, Lublin, Poland
Valeriy Loboda
Department of Nanoelectronic, Sumy State University, Sumy, Ukraine

要約

An analysis of the structure and mechanical properties of multilayer nitride coatings based on Ta depending on the deposition conditions and thermal vacuum-free annealing was conducted. Ta/TaN is a multylayer structure with alternate deposition of a polycrystalline layer of Ta of high ductility and a layer of TaN of high strength. TaN is a coating deposited by magnetron sputtering with the ratio N2/Ar = 0.4, exhibiting a high degree of crystallinity that leads to a high adhesive strength and hardness of Ta/TaN multilayer coatings. For nitride coatings based on refractory elements of the V−VI period, the general patterns consisting in the formation of the NaCl structure, and the predominant orientation of the planes (111) were identified. The application of heat treatment decreases the microhardness of the Ta/TaN multilayer coatings from 2600 to 1200 kgf/mm2, and leads to deterioration of the adhesive strength between the layers. In the process of mechanical testing, the tribological coefficient for the considered protective coatings was 0.1−0.25, the volume of surface wear was 14.3 mm3.


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