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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.19 SNIP: 0.341 CiteScore™: 0.43

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v7.i2.50
6 pages

DIRECT DETERMINATION METHOD OF A GLOBAL APPARATUS FUNCTION IN UV OH SPECTRUM THENNOMETRY

Herve Rabat
LASEP : Laboratoire d'Analyse Spectroscopique et d'Energétique des PLasmas, UPRES-EA 3269 Faculté des Sciences, Site de Bourges, Université d'Orléans, rue Gaston Berger, BP 4043, 18028 Bourges Cedex France
Charles de Izarra
LASEP (Laboratoire d'Analyse Spectroscopique et d'Energetique des Plasmas), UFR-Faculte des Sciences, Antenne de BOURGES, Universite d'ORLEANS, rue Gaston Berger, BP 4043, 18028 BOURGES CEDEX, FRANCE

要約

In a previous paper [I], we have presented a new method to carry out the rotational temperature from the UV OH band at 306.357 nm (transition A2S, v = 0 ® X2P, v' = 0) frequently observed in hot gases containing oxygen and hydrogen (flames, arc plasmas). The method is mainly based on a calibration of the height of 3 unresolved groups of lines obtained by performing a numerical simulation of OH spectrum for different temperatures and for different widths of gaussian apparatus functions. In this paper, we underline mat the apparatus function needed to cany out the temperature with the method described in the reference [1] is not only the pure optical apparatus function of the optical spectroscopic device commonly measured by employing a laser line, but must include the broadening effects of the rotational lines. At least, we propose a numerical method to determine a global apparatus function needed to apply the temperature determination method presented in the paper by de Izarra [1].


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