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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
CiteScore™: 0.43 SNIP: 0.341 SJR: 0.19

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v15.i4.30
pages 275-281

EVAPORATION OF ZIRCONIA IN AN INDUCTIVELY COUPLED PLASMA

Gunter Lins
Siemens AG, Plasma Technology, ZT EN 3, P.O.B. 3220, D-91050 Erlangen, Germany
David W. Branston
Siemens AG, Plasma Technology, ZT EN 3, P.O.B. 3220, D-91050 Erlangen, Germany

要約

Inductively coupled plasma was studied to assess the feasibility of plasma flash evaporation of high-melting materials. The evaporation time of zirconia particles in thermal plasma of 10,000 K was estimated to be 90 and 560 µs for spherical particles with radii of 5 and 12.5 µm, respectively. Inductively coupled argon-hydrogen plasma was generated with a power of 30 kW at a frequency of 4 MHz. Its temperature as inferred from intensity ratios of spectral lines of singly ionized Zr amounted to between 7000 and 8600 K, depending on pressure, thus allowing for the existence of zirconia vapor. It was shown that by laser light scattering zirconia particles with a maximum diameter of 12 µm could be vaporized at a rate of at least 200 mg/min, if the hydrogen fraction of the argon-hydrogen plasma was sufficiently high.