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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.2017024672
pages 143-159

PLASMA EMISSION SYSTEMS FOR ELECTRON- AND ION-BEAM TECHNOLOGIES

D. Antonovich
Polotsk State University, 29 Blokhin Str., Novopolotsk, 211440, Belarus
V. Gruzdev
Polotsk State University, 29 Blokhin Str., Novopolotsk, 211440, Belarus
V. Zalesski
Physical-Technical Institute, National Academy of Sciences of Belarus, 10 Academician Kuprevich Str., Minsk, 220141, Belarus
Igor Pobol
Physical Technical Institute
Pavel Soldatenko
Polotsk State University, 29 Blokhin Str., Novopolotsk, 211440, Belarus

要約

Designs and basic characteristics of plasma sources of charged particles allowing one to realize a wide spectrum of electron- and ion-beam technologies are presented. Some applications of the developed structures of charged particles sources are considered. Sketches of promising designs of gas-discharge structures capable of forming combined electron and ion beams are proposed.


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