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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

年間 4 号発行

ISSN 印刷: 1093-3611

ISSN オンライン: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

Indexed in

PULSED PLASMA DEPOSITION OF OXIDE HARD COATINGS

巻 6, 発行 4, 2002, 14 pages
DOI: 10.1615/HighTempMatProc.v6.i4.50
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要約

In the last years a variety of plasma sources have been developed for film deposition by magnetron sputtering. In addition to RF- and DC-sputter sources, pulsed plasma sources are gaming increased attention in sputter technology. This interest is driven by the wish of depositing coatings with superior properties as compared to those deposited by conventional techniques. One prominent example of coatings that are significantly enhanced by the usage of pulsed sputter deposition is alumina. Although crystalline a-alumina can be deposited by thermal CVD at temperatures above 1000 °C for two decades, no process for the deposition of crystalline alumina at low temperatures is commercially available up to now.
In this paper, the results of a detailed study of the plasma parameters during bipolar pulsed magnetron sputtering and their effect on the properties of alumina hard coatings is reported. Langmuir type voltage measurements at the substrate position, optical emission spectroscopy as well as mass spectroscopy were used to monitor the effect of target poisoning on the reactive deposition of alumina. Those principal observations were connected to easily available process parameters like discharge voltage and oxygen partial pressure. Based on these measurements, the deposition of crystalline g-alumina with high hardness and good adhesion under technical conditions was achieved.

によって引用された
  1. Peters Piet, Hemptenmacher Joerg, Schurmann Hartmut, Production of MMCs on the Basis of Fibres Coated with the Metal Alloy by Magnetron Sputtering, Materials Science Forum, 539-543, 2007. Crossref

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