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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
ESCI SJR: 0.176 SNIP: 0.48 CiteScore™: 1.3

ISSN 印刷: 1093-3611
ISSN オンライン: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

近刊の記事:

THIN-FILM TECHNOLOGY FOR CREATING FLEXIBLE SUPERCAPACITOR ELECTRODES BASED ON A CARBON MATRIX
Anna Diteleva, Vladimir Sleptsov
DOI: 10.1615/HighTempMatProc.2020035840