RT Journal Article ID 43f63c183b8d184b A1 Miernik, Krzysztof T1 VACUUM ARC PLASMA SOURCES JF High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes JO HTM YR 2001 FD 2001-09-01 VO 5 IS 3 OP 5 AB The paper presents the development of research on the vacuum arc discharge with a cold cathode. The most often used methods of arc discharge initiation have been described. The classification of the vacuum arc devices has been made. The basic constructions of the arc sources cathodes have been shown. PB Begell House LK https://www.dl.begellhouse.com/journals/57d172397126f956,3f6e18f522979e73,43f63c183b8d184b.html