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EFFECT OF SILICON AFM PROBE LOCATION ON ABSORPTION PROFILE OF GOLD NANO-STRUCTURES ON A DIELECTRIC SURFACE

DOI: 10.1615/RAD-16.50
pages 34-41

Sina Talebi Moghaddam
Bogazici University, Department of Mechanical Engineering, Bebek, 34342, Istanbul Turkey

Hakan Erturk
Department of Mechanical Engineering Boğaziçi University, Istanbul; and Department of Mechanical Engineering, Middle East Technical University, Ankara 06531, Turkey; Intel Corporation, Chandler, AZ 85226

M. Pinar Menguc
Center for Energy, Environment and Economy (CEEE), Department of Mechanical Engineering, Ozyegin University, Cekmekoy, 34794, Istanbul Turkey; and University of Kentucky, Radiative Transfer Laboratory, Lexington, KY 40506, USA

要約

Effect of silicon (Si) atomic force microscope (AFM) probe position on the local absorption of gold nanoparticles (NPs) placed over a dielectric BK7 glass surface is evaluated. An improved, vectorized version of discrete dipole approximation coupled with surface interactions (DDA-SI-v), is employed throughout the study. It is shown that surface evanescent waves interacting with the system of NPs and AFM probe, resulting a near-field coupling between them. This coupling can enhance or reduce the local absorption by the NP depending on the position of AFM tip in 3D space, K-vector and electrical field of the surface evanescent wave. This concept can be used for selective heating of NPs placed over a surface that enables precision manufacturing at nanometer scales.

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