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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

Publicou 4 edições por ano

ISSN Imprimir: 1093-3611

ISSN On-line: 1940-4360

The Impact Factor measures the average number of citations received in a particular year by papers published in the journal during the two preceding years. 2017 Journal Citation Reports (Clarivate Analytics, 2018) IF: 0.4 The Immediacy Index is the average number of times an article is cited in the year it is published. The journal Immediacy Index indicates how quickly articles in a journal are cited. Immediacy Index: 0.1 The Eigenfactor score, developed by Jevin West and Carl Bergstrom at the University of Washington, is a rating of the total importance of a scientific journal. Journals are rated according to the number of incoming citations, with citations from highly ranked journals weighted to make a larger contribution to the eigenfactor than those from poorly ranked journals. Eigenfactor: 0.00005 The Journal Citation Indicator (JCI) is a single measurement of the field-normalized citation impact of journals in the Web of Science Core Collection across disciplines. The key words here are that the metric is normalized and cross-disciplinary. JCI: 0.07 SJR: 0.198 SNIP: 0.48 CiteScore™:: 1.1 H-Index: 20

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THERMAL STABILITY OF HARD TANTALUM BORIDE FILMS

Volume 24, Edição 3, 2020, pp. 193-200
DOI: 10.1615/HighTempMatProc.2020035911
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RESUMO

The article reports on physical and mechanical properties of the understoichiometic tantalum bo-ride (TaBx < 2) films prepared by magnetron sputtering. The films were grown from a TaB2 target. It is shown that the stoichiometry x of the TaBx film is strongly influenced by its ion bombardment controlled by negative substrate bias Us. It was found that the understoichiometric TaBx < 2 films are hard and flexible X-ray amorphous films with a high H/E* ratio and an enhanced resistance to cracking; here H and E* is the hardness and the effective Young's modulus, respectively. The conditions under which such films are created are given. The thermal stability and oxidation resistance of the sputtered TaBx films thermally annealed in the air are also reported.

Referências
  1. Brandes, E.A., Ed., Smithells Metals Reference Book, 6th ed., Stonenham, MA: Butterworths Publishers, 1983.

  2. Goncharov, A.A., Konovalov, V.A., Dub, S.N., Stupak, V.A., and Petukhov, V.V., Structure, Composition, and Physicomechanical Characteristics of Tantalum Diboride Films, Phys. Met. Metallogr., vol. 107, pp. 285-290, 2009.

  3. Goncharov, A.A., Yunda, A.N., Shelest, I.V., and Buranich, V.V., Effect of the Magnetron Sputtering Parameters on the Structure and Substructural Characteristics of Tantalum Diboride Films, J. Nano- and Electronics Phys., vol. 4, pp. 04014-1-04014-5, 2017.

  4. Lin, S.-T. and Lee, C., Growth of Tantalum Boride Films by RF Magnetron Sputtering, J. Electrochem. Soc., vol. 150, no. 10, p. 607, 2003.

  5. Musil, J., Advanced Hard Nanocomposite Coatings with Enhanced Toughness and Resistance to Cracking, in Thin Films and Coatings: Toughening and Toughening Characterization, S. Zhang, Ed., New York: Taylor and Francis, pp. 377-463, 2016.

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  7. Musil, J., Hard Nanocomposite Coating: Thermal Stability, Oxidation Resistance and Toughness, Surf. Coat. Technol., vol. 207, pp. 50-65, 2012.

  8. Musil, J., Sputtering Systems with Enhanced Ionization for Ion Plating of Hard Wear Resistant Coatings, Proc. of the 1st Meeting on the Ion Engineering Society of Japan (IESJ-92), Tokyo, Japan, pp. 295-304, 1992.

  9. Randich, E., Low Temperature Chemical Vapor Deposition of TaB2, Thin Solid Films, vol. 359, pp. 68-76, 2000.

  10. Shein, I.R. and Ivanovskii, A.L., Band Structure of ZrB2, VB2, NbB2 and TaB2 Hexagonal Diborides: Comparison with Superconducting MgB2, Phys. Solid State, vol. 44, no. 10, pp. 1833-1839, 2002.

  11. Smolik, G.R., Petti, D.A., Sharpe, J.P., and Schuetz, S.T., Oxidation and Volatilization from Tantalum Alloy during Air Exposure, Fusion Technol., vol. 39, no. 2P2, pp. 970-975, 2001.

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CITADO POR
  1. Goncharov Alexander, Yunda Andrei, Kolinko Ivan, Goncharova Svetlana, Fesenko Oleksii, Features of Modeling the Processes of Formation of Films of Refractory Compounds, 2021 IEEE 11th International Conference Nanomaterials: Applications & Properties (NAP), 2021. Crossref

  2. Evans Jordan A., Paz y Puente Ashley E., Robinson Adam B., Glagolenko Irina Y., Jue Jan-Fong, Clark Curtis R., Sohn Yongho, Keiser Dennis D., Microstructural characterization of as-fabricated monolithic plates with boron carbide, aluminum boride, and zirconium boride burnable absorbers, Journal of Nuclear Materials, 559, 2022. Crossref

  3. Pogrebnjak A D, Lisovenko M A, Turlybekuly A, Buranich V V, Protective coatings with nanoscale multilayer architecture: current state and main trends, Physics-Uspekhi, 64, 3, 2021. Crossref

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