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High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v9.i1.90
pages 103-108

Plasma sprayed ceramics for low macroscopic field emitters

R. Tomaszek
Ecole Nationale Supérieure de Chimie de Lille, BP 108, 8, av. Mendeleïev, 59650 Villeneuve d'Ascq, France; and Faculty of Microsystems Electronics and Photonics, Wroclaw University of Technology, ul. Janiszewskiego, 11/17, 50370 Wroclaw, Poland
Z. Znamirowski
Faculty of Microsystems Electronics and Photonics, Wroclaw University of Technology, ul. Janiszewskiego, 11/17, 50370 Wroclaw, Poland
L. Pawlowski
Ecole Nationale Supérieure de Chimie de Lille, BP 108, 8, av. Mendeleïev, 59650 Villeneuve d'Ascq, France
J. Grimblot
Ecole Nationale Supérieure de Chimie de Lille, BP 108, 8, av. Mendeleïev, 59650 Villeneuve d'Ascq, France
J. Zdanowski
Faculty of Microsystems Electronics and Photonics, Wroclaw University of Technology, ul. Janiszewskiego, 11/17, 50370 Wroclaw, Poland
W. Czarczynski
Faculty of Microsystems Electronics and Photonics, Wroclaw University of Technology, ul. Janiszewskiego, 11/17, 50370 Wroclaw, Poland

RESUMO

Plasma sprayed coatings have been investigated as field emission cathodes. The tested materials were Al2O3+13%TiO2, Al2O3+40%TiO2, TiO2. Some of these coatings were laser engraved. The samples used were initially prepared for purposes other than field emission and their components and structures were not optimised for electron emission. The emission properties were evaluated from current-voltage characteristics taken in a diode configuration in a vacuum chamber under a pressure of 1×10−6 Pa. Preliminary results indicate that some layers are good field emitters (threshold field 1×10−7 V/m for Al2O3+13%TiO2). The emission stability was generally good and the emission curves were similar on repetition. No significant hysteresis in I-V plots for "up-and-down" measurements was noticed. A model of possible mechanism of low microscopic field emission is presented and microstructural investigations using techniques of XRD, Raman spectroscopy and SEM techniques of plasma sprayed and laser engraved layers enabled understanding of increase of field enhancement factor.


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