Inscrição na biblioteca: Guest
Portal Digital Begell Biblioteca digital da Begell eBooks Diários Referências e Anais Coleções de pesquisa
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes
SJR: 0.137 SNIP: 0.341 CiteScore™: 0.43

ISSN Imprimir: 1093-3611
ISSN On-line: 1940-4360

High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes

DOI: 10.1615/HighTempMatProc.v2.i1.110
pages 143-154

STRUCTURE AND PROPERTIES OF CARBON AND HYDROCARBON FILMS DEPOSITED IN PLASMA OF LOW-PRESSURE ARC AND UNBALANCED DC MAGNETRON

I.A. Anisimova
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
V.P. Anisimov
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
V.P. Makarov
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic
D.K. Otorbaev
Institute of Chemistry and Chemical Technology - Kyrgyz National Academy of Sciences Prospect Chui 265 A - 720071 - Bishkek - Kyrgyz Republic

RESUMO

Amorphous hydrogenated carbon films were deposited in the plasma of a low-pressure arc discharge burning at the evaporating graphite electrode and in the plasma of a unbalanced magnetron sputtering discharge in different gas environments (Ar, CH4). The film structure was investigated by micro-diffraction method of transmission electron microscopy. Influence of the deposition technique and of the gas composition on the structure and on optical and electrical properties of the deposited films have been investigated.


Articles with similar content:

SYNTHESIS AND PROPERTIES OF FULLERENE CONTAINED FILMS IN RF PLASMA
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.9, 2005, issue 2
V. V. Azharonok, V. D. Shimanovich, L. I. Filatova
VITREOUS SILICA LAYERS SYNTHESIZED BY AN INDUCTIVELY COUPLED PLASMA TORCH (ICPT) WORKING AT ATMOSPHERIC PRESSURE: DEPOSITION AND CHARACTERIZATION
Progress in Plasma Processing of Materials, 1999, Vol.1, 1999, issue
P. Cocito, Cristina Panciatichi, M.C.N. De Leo
PROCESS OF FORMATION OF SPHEROIDAL GOLD PARTICLES AND OF NANOPHASES IN AlN−TiB2−TiSi2 COATINGS AFTER ANNEALING WITH SUBSEQUENT IMPLANTATION
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.19, 2015, issue 2
Katerina Smyrnova, Konrad Kierczynski, Yoshihiko Takeda, Anatoliy Kupchishin, Henryk Komsta, Hiroshi Amekura, Marek Opielak, Bahyt Zhollybekov, Artem Demianenko
LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CARBON FILMS ON DIFFERENT SUBSTRATES
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.10, 2006, issue 3
A. B Ustinov, A. S. Smirnov, A. Ya. Vinogradov, A. N. Andronov, K. E. Orlov
Study of excited atomic states of hydrogen and chemical phenomena on liquid silicon target under a RF inductive thermal plasma torch
High Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes, Vol.5, 2001, issue 2
Jacques Amouroux, F. Bourg, F. Krayem, Daniel Morvan